X-Ray Photoemission Spectroscopy (XPS)


  • Make: PHI
  • Model: 5000 versa probe III
  • Faculty-in-Charge: Prof. R Thangavel
  • Email: xps_crf@iitism.ac.in
  • Phone: 0326-223-5916

PHI III Scanning XPS Microprobe

The VersaProbe III is a highly versatile, multi-technique instrument with PHI’s patented, monochromatic, micro-focused (< 10 um), scanning X-ray source. The instrument offers a true SEM-like ease of operation with superior micro area spectroscopy and excellent large area capabilities.

Optimized Configuration

A focused X-ray beam, high sensitivity spectrometer, high performance floating column argon ion gun, turnkey dual beam charge neutralization, compucentric Zalar™ rotation, and advanced data reduction algorithms provide the highest performance XPS depth profiling capability available. The standard monatomic argon ion gun is capable of generating 5 eV to 5 keV Ar ion beams and is ideally suited for most inorganic depth profiling applications.


The key features of XPS includes:


    1.) Scanned, micro-focused, monochromatic X-ray beam

    2.) X-ray beam induced secondary electron imaging (SXI)

    3.) Dual beam charge neutralization

    4.) 128 data channel detection

    5.) Chemical state imaging

    6.) Single Crater multi-point depth profiling

    7.) Floating column monatomic Ar ion gun

    8.) Compucentric Zalar™ rotation

    9.) Angle dependent XPS

    10.) Five axis automated sample manipulator

    11.) 25 mm and 60 mm diameter sample mount